Precision and environmental tolerance
Since its introduction, the RAITH150 Two has established itself as a bestseller among universal, high resolution Electron Beam Lithography systems. It is used in research and nanotechnology centers worldwide and has proved its robustness in 24/7 use.
The RAITH150 Two exposes structures smaller than 5 nm and works with sample sizes from a few mm to 8-inch wafers.
The system stability, even in difficult environments, required for demanding exposures is made possible by a thermally stabilized and environmentally tolerant shield.
Ultra high resolution and imaging
- Sub 8 nm lithography
- Low kV exposure and imaging
- System automation
- Sample handling up to 8"
- Split room setup / thermo stabilization
Pure research and small batch production
Hardware and software automation allow easy and repeatable jobs for small batch production.
RAITH150 Two´s high resolution electron column in combination with various detectors allows unprecedented flexibility in mark recognition and process control.
- Low voltage Electron Beam Lithography
- 30 kV
- Inlense SE detector
- Energy selective BSE (EsB) detector option
Unique Writing Mode:
- 6“ full travel
- Large Z travel