100 kV Technology, Stitch-free Lithography and more

Raith´s broad technology portfolio for nanofabrication includes electron and ion beams, from low to high energy electrons (20 eV up to 100 kV), for flexible research use and industrial type system automation, mass filtered ion optics to deliver Gold, Silicon, Germanium beyond Gallium, stitch-free-lithography techniques, and emerging processes like beam induced deposition and etching and high precision reverse engineering.